Erratum to: Metallography of Sputter-Deposited SS304+Al Coatings

Tribological behavior of sputter-deposited MoSX/Ni coatings

AbstractSputtered MoS2 coatings have been mostly used as a solid lubricant. In this investigation, MoSx/Ni composite coatings with Ni contents varying from 0 to 22 % were deposited onto steel substrate using a DC magnetron sputter process. The MoS2/Ni ratio in the coatings was controlled by sputtering the composite targets. The composition, microstructure, and mechanical properties of the...

A Study of the Tribological Properties of Sputter-deposited MoSX/Cr Coatings

In this investigation, MoSx/Cr coatings were deposited by direct-current magnetron sputter onto Ck45 (AISI 1045) plain carbon steel substrates. The MoSx/Cr ratio in the coatings was controlled by sputtering the composite targets. The chemical characterization was performed using EDX (energy dispersive X-ray analysis); the structural characterization was accomplished by X-ray diffraction (XRD) s...

Effect of Gas Ratio on Tribological and Corrosion Properties of Ion Beam Sputter Deposited TiN Coatings

Titanium nitride thin films were grown on 304 stainless steel substrates at various nitrogen/argon flow ratios by ion beam sputtering (IBS) technique. The current research is a follow up study on the influence of gas ratio on structural and corrosion properties in the TiN coated 304 stainless steel. Film structural identification of phases was performed using X-ray diffractometry (XRD). Sca...

Strontium-substituted hydroxyapatite coatings deposited via a co-deposition sputter technique.

The bioactivity of hydroxyapatite (HA) coatings can be modified by the addition of different ions, such as silicon (Si), lithium (Li), magnesium (Mg), zinc (Zn) or strontium (Sr) into the HA lattice. Of the ions listed here, strontium substituted hydroxyapatite (SrHA) coatings have received a lot of interest recently as Sr has been shown to promote osteoblast proliferation and differentiation, ...

Metal-to-insulator transition in sputter deposited 3NiÕAl thin films